Used MATTSON HELIOS #9382891 for sale
URL successfully copied!
Tap to zoom
ID: 9382891
Wafer Size: 12"
Vintage: 2009
Rapid Thermal Processor (RTP), 12"
2009 vintage.
MATTSON HELIOS is a rapid thermal processor that utilizes direct heating to conduct high-precision thermal treatments. It is designed to process small and large batches of various semiconductor substrates quickly and efficiently. HELIOS offers advanced capabilities for annealing, sintering, bonding, and curing materials, without the need for in-situ vacuum. With multiple station capabilities, MATTSON HELIOS is a versatile for both pilot and production-level applications. HELIOS' direct thermal energy delivery equipment (DTED) utilizes several innovative technologies to ensure precise and high-quality substrate treatments. Its Advanced Planar Heating (APH) technology evenly distributes heat over the substrate surface while its Three-Point Thermal Control (TPTC) system ensures the highest degree of repeatability. The TPTC technology also allows for precise temperature profiles during the treatment process. MATTSON HELIOS offer great flexibility for accurate and repeatable temperature control. The process controller is equipped with programmable ramp and soak multi-readpoints, which simplifies programming and eliminates the need for additional hardware. The unit is also self-designed to monitor key machine parameters such as chamber pressure, oxygen content, and cooling rate. This ensures compliance with critical quality control standards and critical thermal processing parameters. Furthermore, HELIOS is designed for quick set up and substrate loading. Its advanced integration capabilities enable automatic substrate exchange. Its independent cassette storage functions allow process parameters to be easily recalled for future reference. The design of the cabinet and drawer tool aids in organizing the workload and provides a neat, organized approach for a busy thermal processing laboratory. MATTSON HELIOS can be configured for up to three stations, dependent on substrates being used. It is available in multiple chamber configurations and offers low-cost maintenance. In summary, HELIOS is a cutting-edge rapid thermal processing asset that provides precise thermal treatments with excellent repeatability and accuracy. It is suitable for small and medium production runs and offers users the ability to easily program temperature profiles and monitor key model parameters. Its efficient design and integration capabilities allow for quick setup and substrate loading.
There are no reviews yet