Used MPTC RTP-600XP #168733 for sale
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ID: 168733
Rapid thermal processor
Specifications:
Gases: GN2, PN2, O2
Substrate: 2" Sapphire wafer
(2) MFC Controlled gas lines
With Pyrometer and type KTC
3Phase, 380V, 60Hz
Includes:
6" OD
(4) 2" Pocked silicon carbide coated graphite susceptor
For processing (4) 2" Sapphire wafer
Quartz tube
4"-6" Wafer tray
Currently crated.
MPTC RTP-600XP is a state-of-the-art rapid thermal processor (RTP) designed to meet the rigorous requirements of industrial and advanced research applications. It has been fully optimized for increased uniformity, excellent thermal stability and minimized tool down-time. It has unique multi-purpose functions that enable it to be used in an extreme variety of applications such as: DRAM deposition, high-temperature curing, rapid annealing and dielectric material filling. The device features an advanced Direct Plasma Source Equipment (DPPS), which makes it more reliable and efficient than many other processing systems in the field. This system allows the rapid thermal processor to reach temperatures up to 800°C steadily and quickly, while enabling precise plasma control and high uniformity throughout the process. Additionally, the device also features several advanced safety features such as position sensing, thermocouple control, gas control and high-accuracy temperature control. RTP-600XP includes a series of modules, each able to perform a specific task for customization convenience. The thermal zone enables uniform action of heating and cooling, whilst the vacuum chamber ensures accurate alignment of the substrate. Additionally, the wet-etching chambers allow for the cleaning and etching of substrates. The device features advanced algorithms and displays that allow the user to easily view and control their process. The substrate positioner is adjustable and provides flexibility during operation. The device is designed to be easily used and maintained, with a robust build and material make-up. MPTC RTP-600XP is the perfect choice for any industrial or advanced research application. Its direct plasma source unit, flexible modular machine and accuracy make it one of the most reliable and efficient thermal processors available in the market today. Not only does it deliver the performance and accuracy required for a wide range of applications, but it also does so in a compact and easily manageable form.
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