Used NPS RPH200 #293603755 for sale

NPS RPH200 Rapid Thermal Processor (RTP) is a high-performance, full-featured device designed to optimize thermal processing of semiconductor materials. The equipment is designed to provide precise temperature control, uniform heating and fast ramp rates, wide temperature range, and independent control of each stage of thermal processing. RPH200 is a two-stage RTP with two independent heating elements and is capable of reaching temperatures of up to 500°C. The system includes two independent heating elements that are independently temperature-controlled. Both heating elements can be independently programmed and are automatically synchronized to ensure uniform heating. The powerful heating element configuration enables fast ramp rates, uniform temperatures, and improved temperature uniformity across the wafer. The unit employs a closed circuit ambient pressure control machine, allowing it to achieve uniform pressure control and excellent temperature uniformity across the wafer. Cold plates are also available to provide an alternate cooling source. The tool is designed to be used with a wide array of process tools such as reactive ion etch systems, atomic layer deposition systems, lithography tools, and more. NPS RPH200 has several standard features that facilitate the process control. It includes a multi-channel, real-time process monitor, which allows for process optimization to be monitored and adjusted with ease. An optional embedded oxygen (O2) sensor is also available which provides feedback on the oxygen content of the reaction chamber, allowing for greater process control. RPH200 is a reliable, highly efficient RTP asset capable of process optimization. It provides precise temperature control, uniformity, fast ramp rates, and has the flexibility to be used with a variety of process tools. The model is designed for ease of use, ensuring consistency of results across multiple samples.