Used STEAG / AST / MATTSON Helios #9193169 for sale
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ID: 9193169
Wafer Size: 12"
Rapid Thermal Processor (RTP), 12"
RTA / Spike anneal
Pressure: ATM
Temperature: 1150°C
Front interface: (3) Load ports
Front end: Ball room
Platform:
RORZE Robot 700 Dual arm
Upper arm: Metal blade
Lower arm: QUARTZ Blade
Type: TDK
TAS300
RFID Foup reader
GEM: Ethernet (HSMS)
MATTSON MMC (P/N: 3001068)
MATTSON Sequencer (P/N: 17002560)
MATTSON I/O Controller (P/N: 17000910)
(8) Cooling stations
(4) Dummy stations
Process module 1, 2:
MATTSON Wafer pyro (P/N: 17001048)
MATTSON Lamp pyro (P/N: 17001040)
MFC Model unit
Gas 3 / UFC 8100 / N2 / 20 SLM
Gas 4 / UFC 3101 / N2 / 150 SLM
Gas 7 / UFC 8100 / O2 / 20 SLM
Gas 8 / UFC 3101 / O2 / 150 SLM
Gas 9 / UFC 8100 / O2 / 2 SLM
Process Quartzware: Standard
Electric:
Transformer
UPS Internal
Power supply: 480 V.
STEAG / AST / MATTSON Helios is a rapid thermal processor (RTP) designed to rapidly and accurately facilitate thermal processing of a variety of materials. Utilizing a technique known as rapid thermal processing (RTP), it can quickly ramp up and cool down substrates and material as well as conduct a variety of precise thermal treatments. The advanced technological design behind this RTP allows for it to rapidly manipulate temperatures from 50°C to 1300°C. Additionally, the equipment is able to do so in as little as two seconds, making it a very reliable tool for the speedy processing of many different materials. AST Helios offers high quality, uniform thermal treatment of the substrate in high purity atmospheres as well as a variety of other process atmospheres. The system is also able to maintain excellent thermal uniformity across large substrate wafers, ensuring reliable and repeatable results on many substrate materials including metals, polymers, and silicon and silicon-based compounds. In addition, the unit features an advanced optical pyrometer and bespoke metal halide arc lamps which provide an excellent level of process control and monitoring, ensuring all thermal treatments are easily repeatable and accurate. This further affords users the ability to monitor and respond to sudden temperature changes in order to ensure the substrate is maintained in optimal conditions for the duration of its treatment. The machine is also inherently robust due to its strategic construction. Its industrial grade vibration absorbers and its precise mechanical table motion systems ensures the process is carried out accurately and efficiently. Overall, STEAG Helios is a reliable and highly effective rapid thermal processor that is used for a wide range of materials processing and research projects. Its precision, speed, repeatability, and effectiveness all make it a worthwhile investment for those looking for a reliable and accurate method of thermal treatment.
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