Used STEAG / AST / MATTSON Helios #9235480 for sale

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ID: 9235480
Rapid Thermal Processing (RTP) system Stand alone Handling module: Signal tower: Front Configuration: (3) FOUPs Carrier ID reader Sequencer Ionizer Frequency converter Power supply ionizer 603N3 Step motor linear track VGA Data switch 625S1 Cooling station sensor Supply filter: CIP3 & Quartz blade Robot controller 616N1 Robot Upper & Lower arm Distribution box Potentiometer R603 (FFU) Process module 2: Field box IGBT Box Main switch O2 Sensor: Module Display Reactor door Door cylinder Pyro chiller Control rack Filed box plate Connector plate Control rack Gas box: Gas / Size O2 / 150 SLM O2 / 2 SLM O2 / 20 SCCM N2 / 20 SLM N2 / 150 SLM Sub fab: (2) Blowers Power rack.
STEAG / AST / MATTSON Helios is a rapid thermal processor that enables high-throughput thermal processing of wafer substrates using precise and accurate thermal control. AST Helios is designed to meet the most stringent industrial metrology requirements, and is the only equipment available that provides fully automated precision placement of substrates and rapid annealing times on a single wafer. This system utilizes advanced tracking techniques that measure and track substrate temperature and position during processing. STEAG Helios is a high-performance rapid thermal processor consisting of both an annealing module and a loading/unloading module. The annealing module includes a high-resolution differential scanning calorimeter (DSC) and an induction heating unit, which work together to provide precise temperature control. This machine also utilizes an advanced 6-axis motion control platform to precisely position the specimens during annealing, as well as sophisticated software to control the process. The loading and unloading module of Helios utilizes a robotic arm to transport samples from cassette to the annealing stage and back again. This module also includes integrated vision tool that recognize specimen locations and ensure accurate and repeatable positioning of substrates, as well as end-effector sensors to ensure sample integrity. MATTSON Helios also includes a fully integrated environment chamber for automated atmospheric control. This environment chamber has multiple chambers for controlling atmosphere and gas flow rates during processing, a high-pressure gas supply asset, and programmable temperature and humidity control. The environment chamber also includes a temperature monitoring model to monitor the uniformity of the environment within the chamber. Finally, STEAG / AST / MATTSON Helios utilizes an automated user interface that provides an easy-to-use graphical interface for controlling the equipment. This user interface also includes an integrated software suite that allows for the capture, remote control, and analysis of data during the thermal processing cycle. The software suite also includes tools for optimizing the anneal cycle, as well as real-time monitoring of temperature and position. Overall, AST Helios is a highly optimized rapid thermal processor that provides precise and accurate thermal control for wafer substrates. The system is designed to meet the most stringent industrial metrology requirements, and its integrated automation and advanced software capabilities make it the ideal solution for high-throughput thermal processing.
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