Used STEAG / AST / MATTSON Helios #9235480 for sale
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ID: 9235480
Rapid Thermal Processing (RTP) system
Stand alone
Handling module:
Signal tower: Front
Configuration:
(3) FOUPs
Carrier ID reader
Sequencer
Ionizer
Frequency converter
Power supply ionizer 603N3
Step motor linear track
VGA Data switch 625S1
Cooling station sensor
Supply filter: CIP3 & Quartz blade
Robot controller 616N1
Robot
Upper & Lower arm
Distribution box
Potentiometer R603 (FFU)
Process module 2:
Field box
IGBT Box
Main switch
O2 Sensor:
Module
Display
Reactor door
Door cylinder
Pyro chiller
Control rack
Filed box plate
Connector plate
Control rack
Gas box:
Gas / Size
O2 / 150 SLM
O2 / 2 SLM
O2 / 20 SCCM
N2 / 20 SLM
N2 / 150 SLM
Sub fab:
(2) Blowers
Power rack.
STEAG / AST / MATTSON Helios is a rapid thermal processor that enables high-throughput thermal processing of wafer substrates using precise and accurate thermal control. AST Helios is designed to meet the most stringent industrial metrology requirements, and is the only equipment available that provides fully automated precision placement of substrates and rapid annealing times on a single wafer. This system utilizes advanced tracking techniques that measure and track substrate temperature and position during processing. STEAG Helios is a high-performance rapid thermal processor consisting of both an annealing module and a loading/unloading module. The annealing module includes a high-resolution differential scanning calorimeter (DSC) and an induction heating unit, which work together to provide precise temperature control. This machine also utilizes an advanced 6-axis motion control platform to precisely position the specimens during annealing, as well as sophisticated software to control the process. The loading and unloading module of Helios utilizes a robotic arm to transport samples from cassette to the annealing stage and back again. This module also includes integrated vision tool that recognize specimen locations and ensure accurate and repeatable positioning of substrates, as well as end-effector sensors to ensure sample integrity. MATTSON Helios also includes a fully integrated environment chamber for automated atmospheric control. This environment chamber has multiple chambers for controlling atmosphere and gas flow rates during processing, a high-pressure gas supply asset, and programmable temperature and humidity control. The environment chamber also includes a temperature monitoring model to monitor the uniformity of the environment within the chamber. Finally, STEAG / AST / MATTSON Helios utilizes an automated user interface that provides an easy-to-use graphical interface for controlling the equipment. This user interface also includes an integrated software suite that allows for the capture, remote control, and analysis of data during the thermal processing cycle. The software suite also includes tools for optimizing the anneal cycle, as well as real-time monitoring of temperature and position. Overall, AST Helios is a highly optimized rapid thermal processor that provides precise and accurate thermal control for wafer substrates. The system is designed to meet the most stringent industrial metrology requirements, and its integrated automation and advanced software capabilities make it the ideal solution for high-throughput thermal processing.
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