Used STEAG / MATTSON / AST AST 3000 #9103112 for sale

ID: 9103112
Rapid Thermal Processing (RTP) system, 8" Single chamber (3) Loaders (3) Unloaders 2000 vintage.
STEAG / MATTSON / AST 3000 is a rapid thermal processor (RTP) designed for large-scale thermal processing of semiconductors. The RTP is a scalable, cost-effective equipment with high-speed, high-precision temperature control. The unit provides technicians with a variety of process conditions and accommodates up to three substrates. The RTP utilizes effective heating elements and digital temperature controllers to achieve uniform temperatures throughout the entire process. The system's built-in unit consistence capabilities ensure process repeatability and reliability. The process chamber is designed to reduce contamination and allows for controlled processing conditions, such as pressure and oxygen levels. The RTP is equipped with a robust monitoring machine that tracks processing parameters such as temperature, pressure, and oxygen levels. The tool's advanced control asset provides operators with the ability to control the processes with precision, from setting the temperature of the chamber to adjusting the heating rate and cooling rate. The control model is also automated and interactive, providing the operator with the ability to set and adjust all processing parameters from the control panel in real-time. The RTP utilizes a user-friendly graphical user interface (GUI) which allows operators to conveniently monitor progress and process parameters. Additionally, the equipment provides a range of recipes, allowing operators to quickly adjust settings and parameters as needed for the particular application. The detailed monitoring system and programmability of the RTP makes it a reliable and powerful tool for processing of semiconductor wafers. By facilitating simplified and repeatable output, the RTP helps increase yield, reduce errors, and improve efficiency. The unit is highly scalable and accommodates process transfers, offering flexibility for multiple substrates and wafer sizes.
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