Used STEAG / MATTSON / AST Helios #293593150 for sale

STEAG / MATTSON / AST Helios is a rapid thermal processor (RTP) used for applications such as the fabrication of semiconductor devices, thin films, and nanotechnology. This equipment uses an atmosphere of nitrogen or dry oxygen to rapidly heat samples at high temperatures. The system offers advanced process control with sensors throughout the chamber that monitor critical parameters such as temperature, pressure, and gas flow rate. AST Helios features an open-load platform design with a 4-inch single-wafer servo tray, which allows uniform heat transfer throughout the chamber. STEAG Helios can achieve thermal cycle times as low as ten seconds, enabling quick and accurate processing of multiple samples simultaneously. It utilizes shielded inner and outer liners to prevent material contamination and out-gassing. The Helmios also uses a pre-heated, non-reactive quartz chamber for improved thermal uniformity and surface adhesion. This unit offers precise temperature control from room temperature to 1050°C (1922°F) with up to ±1°C (±1.8°F) accuracy. The user can program up to 40 thermal recipes and access up to five real-time mode operations with set points and hold times. The machine also features a universal controller interface designed to support most semiconductor industry software platforms and has 14-inch display with a graphical user interface that is intuitive and easy to use. Helios is designed with integrated process monitoring feedback systems and vacuum ratings up to 4.5 Torr. It also has an exceptionally low pressure rise rate of 0.02 Torr/min, allowing for more accurate recipe development. MATTSON Helios also offers advanced safety features such as a cut-off switch that stops the entire tool in the event of an emergency. STEAG / MATTSON / AST Helios is an excellent choice for semiconductor processing applications due to its features, flexibility and fast heating capabilities. It is capable of handling complex processes, offers precise control over temperature and pressure and is approved by leading semiconductor technology research centers across the world.