Used STEAG / MATTSON / AST Helios #9219516 for sale
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ID: 9219516
Wafer Size: 12"
Standalone rapid thermal processing (RTP) system, 12"
Process: RTA / Spike anneal
Process pressure: ATM
Process temperature: 115°C
Clean room interface: Front interface with (3) loadports
Front end configuration: Ball room
Platform:
Loadport type: TDK
Loadport model: TAS300
FOUP Reader: RFID
Automation: OHT (E84)
GEM Ethernet (HSMS)
MMC MATTSON P/N: 3001068
Sequencer MATTSON P/N: 17002560
I/O Controller MATTSON P/N: 17000910
(8) Cooling stations
(4) Dummy stations
Robot: RORZE 700 Dual arm:
Upper arm: Metal blade
Lower arm: Quartz blade
Process module 1:
Wafer pyro MATTSON P/N: 17001048
Lamp pyro MATTSON P/N: 17001040
Gas 3: UFC 8100, N2, 20 SLM
Gas 4: UFC 3101, N2, 150 SLM
Gas 7: UFC 8100, O2, 20 SLM
Gas 8: UFC 3101, O2, 150 SLM
Gas 9: UFC 8100, O2, 2 SLM
Low temperature controller: No
Process quartzware: Standard
Process module 2:
Wafer Pyro MATTSON P/N: 17001048
Lamp Pyro MATTSON P/N: 17001040
Gas 3: UFC 8100, N2, 20 SLM
Gas 4: UFC 3101, N2, 150 SLM
Gas 7: UFC 8100, O2, 20 SLM
Gas 8: UFC 3101, O2, 150 SLM
Gas 9: UFC 8100, O2, 2 SLM
Low temperature controller: No
Process quartzware: Standard
Electrical requirements:
UPS: Internal
Transformer power: 480 V.
STEAG / MATTSON / AST Helios is a rapid thermal processor (RTP). It is designed to handle a variety of processes such as rapid thermal annealing (RTA), rapid thermal nitridation (RTN), and rapid thermal oxidation (RTO). Its ability to perform these processes with great control and precision make it a highly valuable equipment for semiconductor device manufacturing. AST Helios has a variety of features that make it suitable for many process demands. It has the ability to ramp temperatures up to 2000°C in a millisecond for processes such as RTA and RTN. Its temperature control systems allow precise regulation of temperatures throughout the process to a resolution of 0.1°C with software, and a resolution of 0.5°C with hardware. The system also features a thermal imaging camera to monitor temperatures and check stability during the process. It can also accommodate up to 8 quartz wafer carriers and support up to a maximum of 100mm wafer sizes for processing. The unit is equipped with several safety features that make it a reliable and safe tool for semiconductor device manufacturing. Its multiple sensors monitor process environment conditions and provide continuous feedback for machine control. The feedback ensures a safe and consistent environment while the process is running. The tool TEC is also designed to handle all safety and temperature demands and is monitored and isolated by its own thermal sensors and asset components. The control model also features configurable controller locks and authentication systems to prevent unauthorized access to the equipment. STEAG Helios has been used in numerous industries, both commercial and academic, to produce high-grade semiconductor devices. Its ability to offer high precision control and repeatable processes make it a valuable tool for device manufacturing. Its multiple safety systems and thermal controls, as well as the thermal imaging capabilities, make MATTSON Helios a reliable and safe processor for many applications.
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