Used STEAG / MATTSON / AST Helios #9273943 for sale
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ID: 9273943
Wafer Size: 12"
Vintage: 2007
Rapid Thermal Processing (RTP) system, 12"
(3) TDK
TAS300 Load port
(2) Chambers
(2) Blowers
2007 vintage.
STEAG / MATTSON / AST Helios is a rapid thermal processor designed to support a wide range of temperature processes such as anneal, oxide, nitride, and diffusion. This industry-leading tool provides precise thermal control, precise temperature uniformity, and fast cycle times for thermal processes. It also offers flexible programming options with the ability to save and recall recipes for multiple process steps, as well as an intuitive interface that allows for fast configuration setup. AST Helios is equipped with several advanced features that give it superior temperature uniformity and control. It utilizes a two-stage heating system in which the heater powers are controlled separately, and a variety of control algorithms are employed to ensure precise temperature control. The heating elements also have a high tolerance for fluctuations in temperature and give a wide range of repeatable profiles. STEAG Helios also employs an integrated pressure-controlled pressure-chamber, allowing it to quickly reach high temperatures and ensure uniform temperature distribution across wafers. It also features temperature sensors and a pressure chamber able to withstand temperatures up to 1000C. The system performs rapid thermal cycles with shorter process times and greater accuracy, which translates to improved process reproducibility. It also has real-time thermography and quadrant monitoring of the wafer that allows the user to observe and monitor the progress of the process. Helios utilizes advanced data collection, signal acquisition, and control software that allows the system to be monitored and controlled remotely and over networks. This software allows for easy remote modification of the thermal cycle without interrupting the process. MATTSON Helios is certainly one of the most robust and reliable rapid thermal processors on the market. Its superior temperature control and uniformity, as well as its fast cycle times and flexible programming options make it a go-to choice for thermal processes.
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