Used STEAG / MATTSON / AST Helios #9275252 for sale

STEAG / MATTSON / AST Helios
ID: 9275252
Wafer Size: 12"
Vintage: 2005
Rapid Thermal Processing (RTP) system, 12" (3) Load ports (ASYST) (2) Chambers (2) Blowers 2005 vintage.
STEAG / MATTSON / AST Helios is an advanced rapid thermal processor used for thermal annealing and wafer processing. It is built on advanced technology for superior temperature uniformity and high rate annealing of large and small features. The processor provides a wide range of anneal temperatures and fast throughput for both discrete parts and wafers. AST Helios comes with a 6" X 6" hot zone and can heat wafers up to 300mm diameter. STEAG Helios' innovative design enables efficient annealing of any piece of material. Its powerful direct-heating technology produces superior temperature uniformity via precise process control. The advanced temperature control equipment ensures that the temperature of the preselected areas is accurate and consistent, making the annealing process more efficient and uniform. MATTSON Helios also offers rapid thermal processing, with maximum ramp rates of up to 1000°C per second. This increases the process speed and turnaround times for individual thermal cycles. Additionally, the system is also equipped with a variety of process monitoring systems, such as real-time wafer monitoring, advanced temperature profiling, and fatigue testing. Other features include a reliable cooling unit, a specialized software for controlling the anneal process, and an auto-alignment machine. Helios also has an integrated nitrogen/helium purge line option, which enables faster preheating, protecting sensitive materials from oxidation and contamination. It comes with a built-in protection and safety tool to prevent over-processing of wafers. STEAG / MATTSON / AST Helios is designed to be easily serviceable and maintainable, even with regular use. Flexible usability and high asset uptime are some of the other advantages of AST Helios. All of these features make STEAG Helios the perfect choice for any thermal processing application.
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