Used STEAG / MATTSON / AST SHS 2800E / 2800 CS #9179203 for sale

STEAG / MATTSON / AST SHS 2800E / 2800 CS is a multi-zone rapid thermal processor (RTP). This equipment was designed to utilize energy-rich infra-red plasma to rapidly heat, cool, anneal, and otherwise process wafers. It is a highly accurate and reliable piece of equipment built for production environments. Its ion-implant compatible equipment can rapidly process even the most complex structures with precision and accuracy. The multi-zone design of the processor incorporates three independent heating, surfacic-cooling, and cooling zones. Each individual zone is equipped with solid state relays, allowing for high speed and uniform temperature cycling. Coupled with the processor controller's rapid processing speed, these features provide for efficient thermal process sequence execution. The axial shower head system of AST SHS 2800E / 2800 CS is a key feature of the processor. It utilizes a high-speed forced-air convection unit to achieve highly uniform thermal profiles on both small and large wafers. The forced-air convection machine is also combined with a transparent quartz shield in order to minimize backside charge build-up on the wafer during processing. STEAG SHS 2800E / 2800 CS also comes with a variety of built-in safety features, including automatic shut-off and continuous, low-level, real-time monitoring of the process environment. These features ensure that the processor operates safely and within established safety guidelines. In addition to its thermal processing capabilities, SHS 2800E / 2800 CS is also compatible with a variety of additive processing necessities, including gas delivery, laser dicing, and more. This processor can be used for a variety of processes, including PEDOT: PSS, buffer layers for compound semiconductor products, and more. MATTSON SHS 2800E / 2800 CS is a high-performance, multi-zone RTP that offers reliable and repeatable results, high efficiency, low-cost operation, and high-speed thermal cycling. This versatile piece of equipment is well-suited for a variety of applications and can quickly and efficiently process a wide range of wafer configurations.