Used ULVAC / RIKO MILA-5000 #9357190 for sale

ULVAC / RIKO MILA-5000 is a Rapid Thermal Processor (RTP). It is a one-of-a-kind tool designed for rapid thermal treatment of substrates, such as semiconductor wafers, fuel cells, photovoltaics, and displays. RIKO MILA-5000 is capable of achieving high-temperature processing with a wide range of temperatures and heating rates. It is capable of maintaining a precise temperature range and uniform heating over unevenly shaped substrates at a high rate of speed, as well as with shorter run times and smaller footprints compared to other systems. ULVAC MILA-5000 can reach temperatures up to 1000°C in air, or much higher with the use of an inert gas atmosphere. MILA-5000 is equipped with a powerful, efficient heating equipment that utilizes ultra-compact, high-power, induction heating coils, which are capable of offering temperature uniformity across substrates in the range of +/-2°C. This system allows for higher temperatures to be reached at a faster rate than traditional systems, without the need for additional heating elements. The unit is also equipped with a unique control machine for precise control of temperature profiles - these control systems allow for custom temperature profiles based on the uniformity requirements of the substrate being processed. ULVAC / RIKO MILA-5000 is a complete tool in a small footprint, with a minimum of components outside of the main enclosure and low power consumption. It is designed for rapid cycling, with temperatures reaching 1000°C in a few milliseconds. Its construction offers excellent temperature stability for long-term processing with a temperature uniformity of +/-2°C. It is capable of treating large substrates as well - up to 300mm - with a pressure of up to 0.4Mpa for higher temperatures or inert gas atmosphere treatment. Additionally, this asset can provide very high-quality film, and is supported by comprehensive traceability, data logging, and safety features to ensure a consistent and reliable process. RIKO MILA-5000 is capable of treating various substrate materials, such as silicon wafers, glasses, and specialty materials like metals and ceramics. Its control model can monitor various parameters of the processing such as temperature, pressure, and gas flow rate. It also offers a wide range of customizable parameters, such as temperature ramp rate, pressure, cyclic rate, and atmosphere selection. The equipment is also equipped with a custom interface, allowing for precise and user-friendly control of the parameters. This makes it an excellent choice for applications such as oxidation, annealing, diffusions, etcetera. Additionally, ULVAC MILA-5000 is backed by a comprehensive technical support system, including maintenance and calibration services to ensure that the unit continues to operate at peak performance.