Used ULVAC RTA-0208S #9107274 for sale
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ULVAC RTA-0208S is a rapid thermal processor (RTP) equipment that was designed to allow users to process various types of wafer materials in a single deposition process. This system combines nitrogen and halogen gas in order to deliver rapid thermal processing (RTP) with uniform heat distribution and precision temperature control. With a large 8-inch capacity, RTA-0208S is able to quickly process wafers of many sizes. This RTP unit is equipped with a chamber temperature ranging from 20-1100°C, as well as a three-point temperature tilt compensation unit that helps ensure an even processing temperature. One of the main features of ULVAC RTA-0208S is its high-temperature capability. It is able to reach peak temperatures of over 1000°C, making it well-suited for intense processes such as rapid thermal annealing (RTA) and rapid thermal reaction (RTR). This RTP unit also offers a liquid nitrogen cooling machine, which helps prevent wafers from overheating and damaging delicate elements. Furthermore, a rotatable gas inlet tool helps evenly distribute gas over the wafers and a quartz liquid nitrogen seal helps keep nitrogen from escaping into the chamber. RTA-0208S also includes a multi-step programming platform, which allows users to create and manage multiple heat-up, hold, and cool-down steps. This programming feature also enables users to optimize their thermal processing according to the various deposition characteristics of the wafers being processed. Furthermore, this asset comes with an intuitive touch panel display with direct data entry, as well as a real-time data display model that offers step-by-step operation guidance. Finally, ULVAC RTA-0208S includes an in-line optical emission spectrometer (OES) that helps monitor fluctuations in wafer characteristics during the deposition process. This feature ensures that the process is being done with optimal accuracy and safety. In addition, the OES monitor can be used to monitor a range of parameters, such as oxygen and hydrogen concentration. This helps to ensure that the wafer temperature and composition remain within desired ranges. Overall, RTA-0208S is an impressive rapid thermal processor with many useful features. Its high-temperature capability, liquid nitrogen cooling equipment, and multi-step programming capabilities make it well-suited for various wafer-processing applications. Furthermore, its real-time data display and in-line OES monitoring system make it an excellent choice for those looking to ensure the accuracy and safety of their thermal processing process.
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