Used AGS MPS-450-RIE #9379089 for sale
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ID: 9379089
Advanced plasma system
MPS-450 Base module:
Console
Chamber
SYS-RIE Power distribution
RIO Interlocks
RIO/RS232 Harness
CLP08
APC2014-PPLC Controller
Configuration options for RIE:
Electrode
RF300w Plasma source
Vacuum: 100 mm, 1CG
Pressure control, 1T
Gas deck: 5 Channels
dry pump: 8cfm-plasma
Mass flow controller options:
MFC Standard (CF4/O2)
MFC Toxic
Toxic gaspod: 6 Channels
Miscellaneous options:
Plasma source: RF600w
Plasma source: RF1000w
Dry pump: 60cfm-Plasma
Turbo package: 240lps-Plasma
Turbo package: 650lps-Plasma
Turbo package: 500lps-MagLev
Option: Assy, ion gauge KF
Temperature controller: 10-30C
Heater jacket: Wall
Plate
quartz cover: 450 mm.
AGS MPS-450-RIE (Reactive Ion Etcher) is an advanced etching equipment utilizing an inductively coupled plasma (ICP) etching process in which inert gas is used, and an electron cyclotron resonance (ECR) process, where microwaves are used. This reactor is designed for a wide variety of etching applications such as etching of through-silicon vias (TSV), MEMS and 3D-IC devices. It has an efficient and precise process control, which maximizes production yield and reduces cost. The system is capable of depositing both positive and negative etch species onto the surface of the substrate by controlling the RF power, gas flows, and chamber pressures. This process ensures uniform etching depth and provides excellent selectivity over the range of materials. The chamber interior is constructed using an advanced stainless steel chamber for high temperature operation. The chamber is also equipped with an in-situ thermal measurement system and cryo-cooling system which helps in precise control of substrate temperature, giving optimum surface quality and accurate process control. MPS-450-RIE is equipped with a multi-frequency RF generator that provides various capabilities for controlling etch rate and selectivity by modulating the RF power. Embedded powerful computer provides an interactive control platform capable of detecting and preventing erroneous operation. It also stores and displays all the statistical data for further analysis. This etcher features a process-oriented design for the in-situ end-point detection and the automated wafer-sensing loading mechanism which significantly reduces process defects and enhances the overall etching performance. It has a quick-change loading tray for loading two wafer boats in one step. It also enables a remote operation via Ethernet and/or serial connections which help meet the requirements of quickly changing production environments. AGS MPS-450-RIE is suitable for various production processes requiring high-quality etching with high throughput. Its reliability, efficiency and durability make it an ideal choice for industrial applications.
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