Used AGS MPS-450-RIE #9379089 for sale

AGS MPS-450-RIE
Manufacturer
AGS
Model
MPS-450-RIE
ID: 9379089
Advanced plasma system MPS-450 Base module: Console Chamber SYS-RIE Power distribution RIO Interlocks RIO/RS232 Harness CLP08 APC2014-PPLC Controller Configuration options for RIE: Electrode RF300w Plasma source Vacuum: 100 mm, 1CG Pressure control, 1T Gas deck: 5 Channels dry pump: 8cfm-plasma Mass flow controller options: MFC Standard (CF4/O2) MFC Toxic Toxic gaspod: 6 Channels Miscellaneous options: Plasma source: RF600w Plasma source: RF1000w Dry pump: 60cfm-Plasma Turbo package: 240lps-Plasma Turbo package: 650lps-Plasma Turbo package: 500lps-MagLev Option: Assy, ion gauge KF Temperature controller: 10-30C Heater jacket: Wall Plate quartz cover: 450 mm.
AGS MPS-450-RIE (Reactive Ion Etcher) is an advanced etching equipment utilizing an inductively coupled plasma (ICP) etching process in which inert gas is used, and an electron cyclotron resonance (ECR) process, where microwaves are used. This reactor is designed for a wide variety of etching applications such as etching of through-silicon vias (TSV), MEMS and 3D-IC devices. It has an efficient and precise process control, which maximizes production yield and reduces cost. The system is capable of depositing both positive and negative etch species onto the surface of the substrate by controlling the RF power, gas flows, and chamber pressures. This process ensures uniform etching depth and provides excellent selectivity over the range of materials. The chamber interior is constructed using an advanced stainless steel chamber for high temperature operation. The chamber is also equipped with an in-situ thermal measurement system and cryo-cooling system which helps in precise control of substrate temperature, giving optimum surface quality and accurate process control. MPS-450-RIE is equipped with a multi-frequency RF generator that provides various capabilities for controlling etch rate and selectivity by modulating the RF power. Embedded powerful computer provides an interactive control platform capable of detecting and preventing erroneous operation. It also stores and displays all the statistical data for further analysis. This etcher features a process-oriented design for the in-situ end-point detection and the automated wafer-sensing loading mechanism which significantly reduces process defects and enhances the overall etching performance. It has a quick-change loading tray for loading two wafer boats in one step. It also enables a remote operation via Ethernet and/or serial connections which help meet the requirements of quickly changing production environments. AGS MPS-450-RIE is suitable for various production processes requiring high-quality etching with high throughput. Its reliability, efficiency and durability make it an ideal choice for industrial applications.
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