Used AIXTRON 2000 HT #9408163 for sale
URL successfully copied!
Tap to zoom
ID: 9408163
Vintage: 1997
MOCVD System
Nitride (GaN)
Planetary reactor
Gas foil rotation
Throughput: 7"x2"
EBARA Dry pump
PC Controller
Source configuration:
TMG
TMA
Cp2MG
TEG
TMI
TMSb
1997 vintage.
AIXTRON 2000 HT is an advanced high-temperature CVD reactor designed for deposition of a variety of materials. It features an advanced multi-zone vacuum chamber capable of reaching temperatures up to 1000 degrees Celsius. 2000 HT is versatile and can be used for a variety of CVD processes including bare wafer deposition, conformal coatings, and more. It also has independent zone control and temperature control for each zone. AIXTRON 2000 HT is powered by a powerful electron-cyclotron-resonance (ECR) plasma source. This powerful source provides good uniformity and repeatability while also giving the chamber extremely quick startup times. The chamber is also capable of using hydrogen gas to create the plasma, which is important for applications such as silicon carbide deposition and other electronic applications. 2000 HT is also equipped with a variety of e-beam sources which can be used for material deposition and recovery. AIXTRON 2000 HT also features a hydraulic loader for safe and efficient loading and unloading of the wafer. This is especially useful for applications that require a large number of wafers or have a need to change wafers frequently. The equipment also features a number of safety features, including high- and low-pressure interlocks and pressure monitoring, to prevent accidental pressure overloads in the chamber. 2000 HT also has a wide range of accessories and software support available. These options expand the capabilities of the system and make it easier to utilize the reactor in different applications and processes. This software also allows users to easily monitor and control the systems operation, including the plasma source and chamber pressure, as well as the temperature of each zone. Overall, AIXTRON 2000 HT is a powerful, versatile, and reliable CVD unit that is perfect for a wide range of CVD processes. It is an easy machine to use and maintain and its wide range of available software and options make it even more user-friendly and capable.
There are no reviews yet