Used AIXTRON 2400 G3 #9395961 for sale

AIXTRON 2400 G3
Manufacturer
AIXTRON
Model
2400 G3
ID: 9395961
MOCVD System.
AIXTRON 2400 G3 is an advanced systems reactive arc deposition power source primarily used in semiconductor and materials research applications. It is based around a three chamber architecture, which enables precise control over processed material properties. AIXTRON 2400G3 employs advanced plasma arc deposition technology, which essentially vaporizes a target material in an oxygen atmosphere and fuses it to a substrate. The result is a layer of material with tailored properties in terms of structure, composition and thickness. This scalability of output makes 2400 G3 ideal for research applications that require a high degree of control and customization. 2400G3 offers a three-chamber reactor architecture, with two independently driven cathodes and an independent ground equipment. Each cathode is independently controlled through a proprietary set of parameters, allowing for unparalleled precision in exacting the desired properties of the output material. Among these parameters are the substrate temperature, power level, system pressure, ion bombardment (sputtering), gas flow, magnetron size and even substrate movement rate. Additionally, it is possible to generate a wide range of materials across different substrate sizes, while still adhering to the specifics of the desired material properties. AIXTRON 2400 G3 is also equipped with a real-time data acquisition unit, capable of collecting data both during and after the deposition process. By utilizing this machine, users can further refine their material parameters to produce an objective result that meets the exact specifications desired. Ultimately, this data collection allows for the analysis of the full deposition process to uncover any flaws or inconsistencies, allowing the user to quickly rectify the situation and continue with the experiment. AIXTRON 2400G3 is a powerful, advanced tool that provides researchers with an unprecedented level of control in the deposition process. Its unique architecture and suite of settings allow for scalability across various materials and substrate sizes, enabling users to tailor their output to an extraordinary degree. With the aid of its real-time data acquisition asset, researchers can further refine their process in order to optimize their results. Together, these features make 2400 G3 an indispensable component for any advanced lab experiment.
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