Used AIXTRON 2400G3 HT #9395960 for sale

AIXTRON 2400G3 HT is a high-efficiency, large-area, closed-cage chemical vapor deposition (CVD) reactor. The reactor is suitable for deposition of a wide range of materials, such as metals, oxides, and nitrides, on up to 200mm diameter wafers. It features a three-chamber configuration for optimal reactor configuration flexibility including: a load lock initiation chamber, a process chamber, and a post-process chamber. The main chamber houses a vertical deposition process zone, and direct view quartz reactor window with an included shutter for monitoring the deposition process. A ceramic-coated showerhead extends from the heated lower section of the chamber, and is used to disperse the reactant gas and purges the chamber during process initiation and shutdown. The reactant gas is introduced into the process through a high-purity, slit-type gas injector located in the side of the chamber. AIXTRON 2400 G3-HT is fitted with two high-tech temperature control systems: a thermoelectric cooling/heating unit providing temperature control between 10°C and 600°C and an infrared radiation heating system. This is coupled with an internal mechanical control system that can rotate the wafer holder to provide uniform heating and cooling across the entire radius of larger processable wafer diameters. The reactor is also highly process-flexible with easy installable inserts providing flexible growth conditions for a range of wafer sizes. These inserts can also be used for substrate materials with thermal expansion mismatch issues. Additionally, the RF and DC power supplies provide excellent process and deposition reproducibility. 2400 G3 HT is designed with safety in mind. It features a flushable and process-tolerant vent shaft for reliable operation under vacuum. The gas injector is engineered to prevent contamination and minimize escape of the process gases from the main chamber. It also includes static bonding and extensive grounding which provides safe and effective control of particle behavior. Additionally, the reactor employs an interlock and PLC system to control access to the chamber ensuring human safety. Overall, AIXTRON 2400 G3 HT reactor is an advanced and reliable solution for process-intensive applications. Its large-area configuration allows for a wide range of wafer applications for metals, oxides, and nitrides while providing reliable process monitoring and uniform heating and cooling. Moreover, 2400G3 HT is designed with safety and process control in mind, providing advanced features such as motion disruptors and RF power supplies.