Used AIXTRON 2600 G3 #9031068 for sale

AIXTRON AIX 2600 G3 is a Remote Plasma Source Reactor. This state-of-the-art solution for semiconductor and microelectronics production is designed to provide high-precision processing of various materials including silicon, germanium, gallium arsenide, and other III-V substrates. It features patented C2 deposition technology that allows the deposition of compounds on a substrate in a cold environment. AIXTRON AIX 2600G3 is comprised of many components: a high vacuum chamber, a process gas equipment, a turbo molecular pump, a capacitor, and an RF energy generator. It ultra-high vacuum chamber is made of stainless steel and is ISO 5 cleanliness certified. The process gas system is controlled by dual mass flow controllers that are available for the deposition of material from either alternative sources or one gas. The turbo molecular pump ensures that the pressure of the chamber remains between 1 x 10-6 and 2 x 10-5 mbar. The capacitor is the most important component of AIX 2600 G3; it stores energy which is then released to the reactor source in a regulated manner, allowing engineers to control thin film growth in a precise manner. Finally, the RF energy generator is responsible for producing sinusoidal high frequency energy. All of these components allow for precision control of the deposition processes, ensuring desired film thickness, uniformity, stoichiometry, and purity are achieved. AIX 2600G3 also has a high throughput of up to 12 wafer platforms per hour, making it a cost-effective and reliable production tool. Additionally, the unit has an integrated measurement machine that facilitates process control. In conclusion, AIXTRON AIX 2600 G3 is an advanced Remote Plasma Source Reactor designed to facilitate the deposition of a variety of materials for semiconductor and microelectronics manufacturing. Its cutting-edge components, such as its dual mass flow controllers, turbo molecular pump, capacitor, and RF energy generator, allow for precise process control to achieve desired results. Additionally, its high throughput and integrated measurement tool make it an efficient and reliable production tool.