Used AIXTRON 2600 G3 #9299680 for sale

AIXTRON 2600 G3 is a state-of-the-art reactor for the deposition of thin films used in semiconductor and LED manufacturing processes. It provides a range of innovative features, allowing for the production of large-area films with superior properties. AIXTRON 2600G3 is capable of conducting a wide variety of deposition techniques, including chemical vapor deposition (CVD) and plasma-assisted CVD (PECVD). It can accommodate up to 3 reactors, making it suitable for multi-reactor processes. The system also features a broad wavelength range and precise wavelength control for advanced nanostructure depositions. The reactor comes with a variety of gas inputs, allowing for tailored process gas flows for best film growth. The three reactors are equipped with individual heating zones for precise substrate heating. The system also offers cutting-edge auto-tuning algorithms based on AIXTRON-proprietary modernized PID method for improved accuracy and repeatability. The chamber of 2600 G3 is made of highly durable stainless steel to ensure reliability and cleanliness. All systems are pressure-tight for a superior leak-free performance and all components are temperature-resistant, allowing for long-term and stable operation. The chamber is also designed to be easy to access and maintain with a central access door and integrated cleaning port. 2600G3 is one of the most advanced and versatile thin-film deposition tools available. It provides a wide range of deposition techniques with optimal process conditions through its flexible design and cutting-edge features. It is ideal for a variety of substrates and applications in semiconductor manufacturing.