Used AIXTRON 2600 G3 #9375669 for sale

AIXTRON 2600 G3 is a type of advanced chemical vapor deposition (CVD) reactor from AIXTRON used for growing materials like graphene and other thin films. The reactor provides users with a highly-efficient and precise process for exact layer thickness control. It is equipped with a large quartz chamber and superior substrate heating capacity, as well as a number of features designed to reduce costs and improve process quality. AIXTRON 2600G3 utilizes AIXTRON advanced diffusion deep-temperature uniformity (DTU) system for precise layer thickness control. This system monitors temperature and mixture across the entire substrate, which helps ensure that films are grown uniformly and at the desired thickness. Additionally, it features a low-growth rate system which further ensures uniform layers and improved stability during deposition. The reactor has a large range of possible substrate sizes and shapes, meaning that films can be grown onto virtually any given substrate. It also has a spacious quartz chamber, allowing for larger substrate sizes and increased coverage area. Furthermore, 2600 G3 features fast heating technology, with both hot wall and cold wall heating capability. This helps reduce overall processing time and improves production yields as heat is transferred more quickly to the substrate. In terms of safety, 2600G3 has a fully automated process that limits manual contact with the materials while processing. It has an enclosed structure which helps ensure safe operation while protecting the chamber environment. The reactor can be equipped with a range of sensors, including oxygen, pressure, temperature, and flow sensors which monitor the environment and alert users in the case of safety risks. Overall, AIXTRON 2600 G3 is a reliable and precise chemical vapor deposition reactor with high-temperature uniformity and a wide range of possible substrate sizes and shapes. Its automated process and extensive safety features make AIXTRON 2600G3 an excellent tool for producing thin films and uniformly depositing materials.