Used AIXTRON 2600 G3 #9395959 for sale

AIXTRON 2600 G3 is an inline chemical vapor deposition (CVD) reactor designed specifically for thin-film deposition of functional materials. This reactor is equipped with a revolutionary susceptor geometry, advanced temperature control, and independent gas flow paths to ensure maximum process flexibility and repeatable results. Its automated, multi-zone temperature control system ensures an optimal growth temperature for a wide variety of deposition materials. The susceptor geometry of the reactor is well-suited to the production of small feature sizes for use in 20 nanometer technology nodes. AIXTRON 2600G3 is designed with a modular, end-to-end design that provides flexibility and efficiency of the process. The reactor features a multi-zone gas flow path design which allows the independent regulation of reactant and carrier gas concentration, inlet temperature, and gas locations. The reactor's automated susceptor design is also optimized for the deposition of high-quality thin films and an even temperature profile with homogeneous cycling resulting in maximum yield. 2600 G3 is versatile in its use of functional materials and is equipped to handle a wide variety of materials such as oxides, dielectrics, nitrides, polymers, alloys, and more. This elegant design boasts a high throughput and low cost of ownership and can be operated in a variety of configurations. In addition, it is equipped with a user-friendly interface for automated control and monitoring of the CVD process, which allows you to adapt the system to your specific needs. 2600G3 is also equipped with a number of other features such as a video microscope, EnduraPlus functions, online predictive service and more. This advanced system is designed to maximize your productivity and to ensure the highest possible quality of thin-film deposition. AIXTRON 2600 G3 is a powerful CVD reactor with the features and specifications required by producers of the leading edge technology products.