Used AIXTRON 2600G3 HT #9395958 for sale

AIXTRON 2600G3 HT is a high throughput cluster-type chemical vapor deposition (CVD) reactor, designed for high-rate deposition of thin-film materials. This equipment is based on the modular single-wafer configuration and can process up to 16 wafers simultaneously, making it ideal for large-scale production applications. AIXTRON 2600 G3 HT is equipped with a variety of automated features for ease of operation. A high-throughput gas mixing system allows for rapid adjustment of the deposition rate and composition of the deposited film. The unit also has an interchangeable susceptor design, allowing it to quickly switch between different wafer sizes and substrate materials. The machine's compact, lightweight design makes it well-suited for laboratory or production-oriented applications. The deposition process is by directional reactive gas ratio with a high deposition rate option, allowing for improved throughput speed. In particular, efficient zoning at the site of the reactor makes it possible to control the process for deposition of films with specified properties. Thanks to the fast heating rate of 2600G3 HT, it is possible to achieve an excellent temperature uniformity across the wafer, the substrate, and the substrate holder. High thermal conductivity of the susceptor allows for improved temperature homogeneity of the film, and the susceptor can be quickly replaced if necessary, reducing downtime. 2600 G3 HT temperature range is from room temperature to 700°C, allowing it to deposit a wide range of materials, such as dielectrics, metals, oxides, and alloys. The high temperature capability of AIXTRON 2600G3 HT makes it suitable for depositing metal oxide semiconductor (MOS) films, such as tungsten oxides and silicides. AIXTRON 2600 G3 HT is also equipped with a number of automation features, including a programmable controller, full-time integrated gas flow monitoring, and a programmable safety interlock tool. Additionally, 2600G3 HT is designed for operation under inert gas, providing a clean environment for precise deposition of high quality films. In summary, 2600 G3 HT is an ideal tool for deposition of thin-film materials in both research and production environments. Its efficient deposition process and automated features provide improved throughput speeds with excellent temperature uniformity and high quality films. To ensure safe and successful operation, AIXTRON 2600G3 HT is equipped with a number of safety features and is designed to operate under an inert environment.