Used AIXTRON 2600G3 IC #9188592 for sale

AIXTRON 2600G3 IC is an advanced deposition tool from AIXTRON that is used to deposit high-quality thin-film materials onto substrates. The tool consists of a vacuum chamber, a reaction chamber, and a source chamber. Its design features a patented multiwire grid and a gas injection equipment that provide unparalleled uniformity and flexibility. The main component of the tool is the vacuum chamber, which is used to create a vacuum from 10-7 Torr. The base pressure of the chamber is less than 10-9 Torr. The chamber is equipped with an adjustment window and a safety shield. This is used to ensure that the chamber is safe for operation in various pressure and temperature ranges. The reaction chamber of 2600G3 IC is a vertical reactor chamber with a 6" wide by 24" high quartz window. It is capable of reaching temperatures of up to 2000°C and is supported by high-precision motion controllers for precise positioning of the substrates during processing. This is also helped by the integrated mirror-injection shield system, which provides extremely precise motion control for the substrates. The chamber also has a special gas injection unit which provides uniform and even injection of gas to improve the quality of the deposited film. The source chamber of AIXTRON 2600G3 IC is where the materials are initially prepared for deposition. This chamber has a temperature range of -50°C to 1000°C, which can be controlled and monitored by the tool's advanced software. The chamber is also equipped with a specially designed multiwire grid machine which provides high-quality, reproducible film growth. Overall, 2600G3 IC is a highly advanced deposition tool that offers unparalleled film uniformity, flexibility, and high-quality films. It is an ideal choice for a wide variety of thin-film deposition applications, including deposition of oxides, metals, and other thin-film materials.