Used AIXTRON AIX 200/4 RF #9195285 for sale

AIXTRON AIX 200/4 RF is a process reactor specifically designed for the production of near-nanometer thin films. This reactor has been widely used in the industry to produce a wide variety of materials such as metals, semiconductors, and other technologies for thin films. It features a 3-axis configuration including an electrode platform, a separate substrate plane, and a reaction chamber. The electrode platform in AIXTRON AIX 200/4 RF feature an RF source with frequency sweeping capabilities. This allows for higher throughput and improved product uniformity. Additionally, the electrodement can be easily adjusted in both frequency and power values to optimize the plasma emission process. The substrate plane is also adjustable, allowing users to manipulate the substrate's position in the reaction chamber. AIXTRON AIX 200/4 RF reactor can also be programmed to accommodate a variety of configurations. With a maximum working temperature of 1600°C, this chamber can be used for processes such as sputter deposition, wafer bonding, thin film growth, and planarization. Additionally, this reactor is equipped with a high-power optical pyrometer for temperature control. This allows users to attain precise, homogeneous growth of thin films. AIXTRON AIX 200/4 RF is also compatible with a range of operating gases. These include argon, krypton, nitrogen, and oxygen. As such, the reactor can be tailored to fit a variety of needs, allowing for optimal reaction conditions and excellent film quality. This reactor is also equipped with a housing that is designed with a special venting system to provide superior temperature, pressure and voltage control. In addition to its flexibility in terms of its operation, AIXTRON AIX 200/4 RF is designed to be easy to maintain and can be easily monitored and troubleshooted. With its advanced digital control and diagnostic system, this reactor is capable of providing real-time feedback regarding its performance. Additionally, this reactor features a built-in memory system which stores up to 99 predetermined process recipes, allowing users to recall and resume the desired process quickly. Overall, AIXTRON AIX 200/4RF reactor provides an ideal combination of flexibility, power, and reliability. With its programmable operation modes and comprehensive monitoring and diagnostic capabilities, this reactor enables users to successfully produce near-nanometer thin films with precision and accuracy within a range of industrial applications.