Used AIXTRON AIX 2000 #9376992 for sale

AIXTRON AIX 2000 reactor is an advanced chemical vapor deposition equipment that is used for growing thin films. It is a single-chamber, horizontal tube furnace system that uses low-temperature reactions to deposit thin films on a substrate. AIX 2000 has an integrated quartz tube, along with internal and external heating elements. AIXTRON AIX 2000 is equipped with a pneumatically sealed door, which allows the process gases to enter the evacuated furnace tube and the physics of the process prevents the infiltration of ambient air. AIX 2000 has a host of available process control features, which allow it to be highly adaptable for many deposition applications. It contains an integrated automated process control unit that can accurately control the deposition rate and temperature inside the furnace tube. It also utilizes a gas management machine that allows for independent control of the gas composition and flow rate, as well as pressure control and monitoring. AIXTRON AIX 2000 is designed for highly controllable, repeatable, and reliable thin film deposition processing. It has a two-zone heating tool which allows for heated sample and substrate surfaces for uniform, low-temperature deposition reactions. It also provides a low-temperature reaction environment which eliminates damage to the substrate or samples during thermal cycling. AIX 2000's process chamber has a built-in gas management asset and a advanced cooling model. This allows for a variety of high-quality thin-film applications with a precise and controllable deposition rate. AIXTRON AIX 2000 reactor has a built-in optical equipment that permits the operator to monitor the growth progress and can also monitor the deposition quality. AIX 2000 reactor is an efficient, cost-effective tool for depositing optically active metal oxide thin films. It can be used for various types of thin-film related research projects, such as LED fabrication, solar cell fabrication, optical devices, photovoltaic cells, and optoelectronic films. In addition, AIXTRON AIX 2000 reactor is equipped with a variety of process control features, including pressure control, temperature control, gas composition control, and gas flow rate control. Overall, AIX 2000 reactor is a reliable, cost-effective tool for depositing a variety of high-quality thin films. It offers a variety of advanced process control features and a built-in gas control system to greatly reduce the risk of film contamination. Furthermore, it has an advanced cooling unit and an integrated optical machine to monitor the film deposition quality and homogeneity.