Used AIXTRON AIX 2400 G3 HT-L #293651622 for sale

AIXTRON AIX 2400 G3 HT-L is a highly versatile Hybrid Tool (HT) equipment solution providing users with a unique combination of excellent hardware and sophisticated software. The system can be used for various semiconductor epitaxy processes including Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD). With its advanced design, the AIX 2400 G3 CT-L is designed for increased reliability and improved productivity performance. AIX 2400 G3 HT-L is a time-tested universe for all III-V-Semiconductor, Silicon germanium and compound semiconductor materials as well as Silicon. Its high uniformity and enhanced throughput performance makes it ideal for today's semiconductor epitaxy requirements. The unit also supports deposition at high deposition rates and repeated lifts and replaces of substrate wafers. AIXTRON AIX 2400 G3 HT-L is equipped with a sophisticated AI-based control machine which allows users to set up a variety of repeatable and programmable sequences to control the process parameters. As well as the ability to operate in both continuous and step modes. This hybrid model handles a variety of materials such as III-V semiconductors, Silicon Germanium and compound semiconductor materials as well as Silicon. AIX 2400 G3 HT-L includes a unique multisource holder which allows up to 6 sources which can be controlled in a precise, stepwise sequence. This further enables quicker device production times and improved uniformity at the wafer level. The version of the tool also offers an integrated Rapid Thermal Processing (RTP) unit for rapid thermal anneal of the semiconductor material. In addition, AIXTRON AIX 2400 G3 HT-L supports state-of-the-art inline and ex-situ metrology. The in-situ metrology probes are efficient in determining the quality of the film deposition, thickness, crystallinity and surface roughness. This enables high process control, uniformity and increased throughput performances. AIX 2400 G3 HT-L is the optimal choice for production of advanced semiconductor devices and is an excellent alternative to existing systems. It offers reliable and fast operations, efficient process control and excellent process quality.