Used AIXTRON AIX 2400 G3 HT #293725009 for sale

AIXTRON AIX 2400 G3 HT is a CVD reactor designed for the deposition of High-k Dielectric, Semiconductor, and Ultra-thin films. AIXTRON AIX 2400 G3 / HT has a process chamber that provides a wide temperature range and low thermal mass environment to enable fast ramp up times and high throughput. It has a large deposition area and accommodates up to 30 standard substrates up to 200mm. It has a high power RF generator, which can provide an RF power up to 15kW and pressures up to 100 milli Torr (mTorr). It has a high-end temperature controller which can precisely control temperatures up to 800°C. It also features an automatic dopant concentration monitor. AIX 2400 G3 HT utilizes a patented liner-flow reactor design, providing superior process uniformity, excellent deposition rate, reduced particle generation and improved substrate uniformity. The flow reactor supplies a steady source of reactive gases from the top of the reactor. The source gases are fed through the liner and mixed in the mixing chamber to eliminate sulphur contamination, providing better material dose control. The interior of AIX 2400 G3 / HT is equipped with high heat resistive aluminum components and special insulation. The process chamber is made of a durable stainless steel to ensure long service life. AIXTRON AIX 2400 G3 HT has advanced SPC and process control functions which offer the users an easy and rapid optimization process. In the end-point monitoring mode, AIXTRON AIX 2400 G3 / HT can perform an automatic monitor process by using off-line spectra tester. Finally, AIX 2400 G3 HT is compliant with the SEMI E84 and RoHS standards. It carries a powerful combination of design features which provide industry-leading material process performance, uniformity and repeatability.