Used AIXTRON AIX 2400 G3 HT #293826515 for sale

AIXTRON AIX 2400 G3 HT is a revolutionary tool for the development and manufacturing of III-V compound semiconductor materials. This reactor enables the development of materials with properties that exceed those of conventional semiconductor materials. AIXTRON AIX 2400 G3 / HT is a horizontal showerhead reactor with a temperature-stabilized substrate chuck. It operates in a constant temperature and pressure environment, creating even growth on the substrates. The horizontal chuck eliminates any effects from an external gravitational field. The showerhead system atomizes the precursor gas and gives full-range exposure to the substrates. All components of the reactor can be temperature-controlled including the walls, the showerhead, and the substrate chuck. The showerhead of AIX 2400 G3 HT is designed to provide uniform distribution of the source material on the substrates. Atomization and pattern formation of the source material is controlled by a number of different parameters. The source material is delivered via gas or liquid to the showerhead which evenly distributes the source material. AIX 2400 G3 / HT reactor also has in-situ cleaning capability. This allows the substrate to be cooled and cleaned between runs. This process increases the quality and accuracy of the grown material and also reduces cross-contamination on the wafers. AIXTRON AIX 2400 G3 HT is the ideal tool for the development of III-V compound semiconductor materials. It offers uniform, reproducible deposition under constant temperature and pressure conditions. The in-situ cleaning capability ensures greater accuracy and quality of the grown material, and its efficient atomization allows for full-range exposure of the substrates. This revolutionary reactor is essential for the growth of high-quality III-V compound semiconductor materials with improved optical, electrical and thermal properties.