Used AIXTRON AIX 2400 G3 HT #9243847 for sale

AIXTRON AIX 2400 G3 HT is a multi-chamber, wide-area quartz reactor designed for high-throughput epitaxial deposition processes. Its core technology, a high temperature, large capacity, quartz tube-based equipment, makes it highly capable of producing commercial-grade, nanostructured thin film devices. AIXTRON AIX 2400 G3 / HT is one of the most advanced reactors available today and is extremely suitable for semiconductor and optoelectronic applications, with a proven track record in both organic thin film technologies and wide area display fabrication. AIX 2400 G3 HT is comprised of two independent, opposed process chambers. The first chamber is the source chamber, which contains a separately insulated donor source, a thermally controlled crucible, as well as a shuttered substrate holder, whose position can be finely adjusted to ensure uniformity of deposition during processing. The second chamber is the reaction chamber, which is fitted with independently heated quartz tubes that feed with gaseous species from a gas box. AIX 2400 G3 / HT utilizes a comprehensive range of standard precursor release techniques, including dynamic split-zone and pulsed split-zone injection, as well as a selection of previously established thin-film deposition processes, including atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and hot filament-assisted chemical vapor deposition (hot-fil CVD). In addition, AIXTRON AIX 2400 G3 HT can accommodate a diverse range of device structures, from high mobility compound semiconductor channels to thin film oxide structures and multilayer stacks. AIXTRON AIX 2400 G3 / HT offers users the flexibility to control the temperature of the catalyst environment via an integrated thermal management system situated at the interface between the source and reaction chamber. In addition, AIX 2400 G3 HT includes an array of high-resolution profiling probes, allowing users to dynamically study the evolution of their process in real time. AIX 2400 G3 / HT is engineered to consistently deliver superior process quality and product throughput in a highly cost-effective manner. Its built-in safety unit monitors the operating parameters of the entire machine to keep the process within pre-defined bounds and prevent accidental process deviation. In addition, AIXTRON AIX 2400 G3 HT can be programmed to run both macro and micro-scale processes, allowing users to gain an unprecedented level of process control over their deposition process. AIXTRON AIX 2400 G3 / HT has been designed to be an extremely robust and versatile tool. Its impressive combination of advanced technology and process controls make it a top choice for both research and industrial applications. With its comprehensive suite of features, users can be assured that AIX 2400 G3 HT has the ability to produce reliable, high-quality devices quickly and cost-effectively.