Used AIXTRON AIX 2400 G3 HTL #9300885 for sale

AIXTRON AIX 2400 G3 HTL is a state-of-the-art organometallic chemical vapor deposition (OMCVD) reactor equipment for high-throughput depositions of advanced materials. It is designed for high reliability and low maintenance due to its low-consumption design and minimal downtime requirements. The reactor is composed of several components, including an open-chamber reactor, a hot-wall quartz reactor, a 6-way centering device, and a computer-controlled material introduction systems. Additionally, AIX 2400 G3 HTL includes a power supply, safety systems, and a high-vacuum system. The open-chamber reactor within AIXTRON AIX 2400 G3 HTL is designed to operate in a vessel capacity of 200-1000 mL and is constructed of stainless steel, resulting in excellent corrosion resistance and long-term durability. This reactor also utilizes hot-wall quartz technology, which is designed to improve the quality and uniformity of deposition layer production. The 6-way centering device can easily be positioned and set for precise wafer position control. This feature enables more efficient production overall, as well as greater consistency and repeatability in the production process. In addition to the open-chamber reactor, AIX 2400 G3 HTL also comes equipped with a material introduction unit. This machine is designed to securely supply source materials to the chamber. The material introduction tool is designed with a heated quartz crucible along with flow controllers and a thermocouple, which allow for precise control of flow, temperature, and pressure. The computer-controlled material introduction asset offers high accuracy throughout the deposition process, reducing the chance of errors. AIXTRON AIX 2400 G3 HTL also includes a power supply and an array of additional safety systems, including an integrated gas warning model, inert gas purging to minimize oxidation, emergency shutdown and venting procedure, real-time low-level quality assurance feedback, and a variety of process monitoring tools. The reactor is also equipped with a high-vacuum equipment which utilizes turbo pumps capable of reachingpressures as low as 0.001 mbar for improved production accuracy. To summarize, AIX 2400 G3 HTL is a state-of-the-art OMCVD reactor designed for high-throughput depositions of advanced materials. The reactor contains several components, including an open-chamber reactor, a hot-wall quartz reactor, a 6-way centering device, a computer-controlled material introduction system, a power supply, an array of safety systems, and a high-vacuum unit. This reactor offers high-precision deposition production along with minimal downtime, while its stainless steel chamber construction ensures excellent corrosion resistance and durability.