Used AIXTRON AIX 2600 G3 #9393354 for sale

AIXTRON AIX 2600 G3 is a high-performance epitaxial reactor used for research and development activities. It is a versatile equipment capable of handling a variety of materials and processes, such as high temperature annealing, in situ silicidation, and ultra thin layer deposition. The system is designed to meet the common demands of substrate size, temperature control, and repeatability that are often required to achieve target device performance. AIXTRON AIX 2600G3 is capable of operating in low-pressure (<10 mbar) and low-temperature (<250°C) operation, as well as high-pressure (>10 mbar) and high-temperature (>1000°C) operation, which enables reliable process control and optimization. The advanced temperature and flow control unit ensures uniform epitaxy for undamaged base layers, and the machine provides high-accuracy positioning for maximum material utilization and throughput. AIX 2600 G3 includes a powerful touch-screen controller, which provides an intuitive user interface and real-time monitoring of process parameters such as pressure, temperature and flow. This ensures that users have full control of the process and can monitor the results in real-time. The equipment is also equipped with a wide range of safety features, such as an over-temperature interlock and a reverse-heated-zone sensor, to ensure the safety of personnel and of the materials. AIX 2600G3 has been designed with a focus on long-term reliability and performance, low-maintenance costs and a high level of process control. It is a versatile, high-performance tool, ideal for use in research and development of substrate-based epitaxial processes, such as thin-film deposition, annealing, and doping processes. It is also suitable for advanced applications such as cavitation, electron-beam, and ion implantation processes.