Used AIXTRON AIX 2800 G4 HT #9064063 for sale

AIXTRON AIX 2800 G4 HT is a type of reactor designed specifically for high-temperature applications. It is made of a low-pressure, split-flow slug flow reactor, featuring an upstream mixing section and an internal helical coil heat exchanger. AIXTRON AIX 2800G4-HT features a power supply of up to 16 kW in high-temperature applications and is designed to achieve a temperature range of 1900°-2200°C. The reactor is equipped with a high-temperature gas equipment, including a high-temperature mini reactor body, gas booster, heated chamber, temperature controller, and a mass-flow controller. The reactor's gas system is designed to provide the required gas cooling and heat storage, allowing the machine to maintain uniform temperature without endangering the integrity of the reaction. AIX 2800G4 HT is also equipped with a flow distribution unit, which uses a special jet-mixing geometry to ensure uniform residence time and even flow throughout the reaction zone. The reactor also includes a series of optical components, such as quartz windows, optical sensing systems, and a high-resolution camera machine, allowing for the observation and analysis of the reaction process. AIX 2800 G4 HT reactor is specifically designed to be used in the production of high-temperature deposition materials. The reactor makes use of high-power cathodes and the substrate or target is heated during the reaction, enabling a wide range of applicable materials from organic to oxide-based materials. In addition, AIX 2800 G 4 HT reactor is designed for the production of SiC, graphene, and diamond-like carbon materials, allowing for high-density, high-percentage film deposition. The reactor also features automated controls and an intuitive user interface, making it ideal for industrial applications. Overall, AIX 2800G4-HT is an effective and reliable reactor, specifically designed to help produce high-temperature materials. The reactor features high-power gas systems, a jet-mixing flow distribution tool, and is able to accurately and uniformly reach deposition temperatures of up to 2200°C. With its automated interfaces and intuitive interface, the reactor is an ideal tool for industrial applications.