Used AIXTRON AIX 2800 G4 HT #9064065 for sale

AIXTRON AIX 2800 G4 HT
Manufacturer
AIXTRON
Model
AIX 2800 G4 HT
ID: 9064065
Vintage: 2010
GaN MOCVD System Second wave length: 405 nm Source: TMGa-1,TEGa-1,TEGa-2, TMAl-1, Cp2Mg-1, TMIn-1, TMIn-2 (2) Spare sets Thermal baths: (5) RM 6S (2) RM 25S 2010 vintage.
AIXTRON AIX 2800 G4 HT is a state-of-the-art plasma-enhanced chemical vapor deposition (PECVD) reactor designed for deposition of thin films. The reactor operates at a range of process temperatures from room temperature up to 800°C, depending on the material. The plant is equipped with a range of process gases and is capable of producing high-quality thin films of a variety of materials. AIXTRON AIX 2800G4-HT is a three-chamber design that can be configured as either a single-chamber or split-chamber equipment, depending on the type of deposition desired. The main processing chamber is enclosed within an inverted bell-shaped stainless steel chamber, with an integrated cooling system that both cools the substrate and removes process-related heat. A gas source manifold is integrated into the bell-shaped chamber, allowing for the delivery of up to four process gases for the deposition of a wide range of materials. The main chamber includes a backside gas injector for the delivery of reactive species for more difficult thin-film applications. The chamber also features an option for a gas-based degasification chamber, allowing for the removal of either gas-phase contaminants or material-related species from the process gas. AIX 2800G4 HT also features a range of optional features for more advanced deposition processes such as its pulse-based deposition chamber. This chamber is designed to further improve control of film thickness and composition by providing a pulsed input of process gases for selective area deposition processes. The control unit for AIXTRON AIX 2800G4 HT is based around a powerful personal computer, providing an intuitive graphical user interface for the operator. The reactor is also designed to be compatible with integrated process monitoring and metrology systems, allowing for the precise control of film properties. Overall, AIX 2800 G 4 HT is a sophisticated thin-film deposition machine offering precise control of film properties and excellent repeatability. With its range of advanced features, AIX 2800G4-HT is a powerful tool for any thin-film deposition operation.
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