Used AIXTRON AIX 2800 G4 HT #9123393 for sale

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Manufacturer
AIXTRON
Model
AIX 2800 G4 HT
ID: 9123393
Vintage: 2010
MOVPE System GaN System Configured for LED substrate Aixact software version: 6.1.6.8 (12) MO's (7) Actives (TMGa, TMAl, TMIn, TEOS, CBr4, Cp2Mg, TEGa incl. MFC/PC etc.) Dopant lines: Double dilution Pumps: Process pump: EBARA A70W Glovebox pump: VARIAN Tiscroll 300 Door-pump: VARIAN Triscroll 300 Insitu monitoring: Photrix H2 Purifier: ENTEGRIS 2,8l N2 Purifier: ENTEGRIS 2,8l NH3 Purifier: ENTEGRIS 2,8l MFC: BRONKHORST 2010 vintage.
AIXTRON AIX 2800 G4 HT is a state-of-the-art production reactor designed for the deposition and processing of compound semiconductors such as GaAs, InP and GaN. This equipment allows for the deposition of these materials in high-growth rates and excellent layer uniformity. The system's reactor configuration is specifically designed to perform large runs of up to 800 mm wafers in a single batch. AIXTRON AIX 2800G4-HT utilizes a horizontal quartz gas distribution plate, which evenly distributes the reaction gases over the entire substrate for improved uniformity. The highly flexible load lock unit offers unparalleled convenience, and allows for transport between load and processing chambers without breaking vacuum. AIX 2800G4 HT features a heated showerhead with an 8-stage controlable temperature distribution for optimized deposition performance and layer quality. For improved uniformity, the reactor is outfitted with a rapid moving susceptor to provide layer uniformity and optimal bed uniformity. Other features include an integrated pressure control machine, which allows for precise gas control for a wide range of substrates and process conditions. The load lock is also equipped with a UV purge lamp to ensure high cleanliness levels before entering the reaction chamber. AIX 2800G4-HT also incorporates intelligent recipe software, which optimizes tool performance through automatic process optimization functions. Additionally, AIXTRON AIX 2800G4 HT is designed for safe operation, featuring a safety seal chamber which prevents the reaction gases from escaping into the working environment. This asset also utilizes a closed-loop recirculation model to reduce the usage of highly toxic reaction gases. It meets or exceeds all applicable safety standards, giving users peace of mind while they are operating the equipment. In summary, AIX 2800 G4 HT is a powerful, highly precise production reactor designed for the deposition and processing of compound semiconductors. It offers quick, uniform deposition, integrated pressure control and a UV purge lamp for superior layer quality and cleanliness. With its optimized design and integrated safety features, AIXTRON AIX 2800 G 4 HT is an invaluable tool for users in the semiconductor industry.
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