Used AIXTRON AIX 2800 G4 HT #9171480 for sale

AIXTRON AIX 2800 G4 HT is a high-throughput, single-wafer planetary reactor for high-temperature catalytic processes. It is designed for the thermally enhanced deposition of a wide range of thin film materials related to power electronics, optoelectronics, VLSI, MEMS and microsystems. AIXTRON AIX 2800G4-HT is based on a robust access, heat-pipe cooled, dead-end configuration for highly efficient, uniform and reproducible deposition of high-temperature, refractory materials such as metal silicides and nitrides. The equipment features a large process zone that can accommodate wafers up to twelve inches in diameter. The process chamber design of AIX 2800G4 HT is based on the proven principle of a heat-pipe cooled, single-wafer planetary geometry. This design provides an optimal thermal balance between hot spots and cold areas, an excellent uniformity of film thickness and density. AIX 2800 G 4 HT also utilizes an innovative Access Chamber along with a unique gas shielding technology. This access chamber permits efficient loading/unloading of wafers and provides a clean environment for substrate processing. AIXTRON AIX 2800G4 HT incorporates a high-throughput auto-pulsing system that ensures flawless fabrication of films, eliminating wafer-to-wafer variations and particle erosion. The unit also has an integrated, intelligent machine controller and software that enhances user safety while optimizing deposition parameters. The integrated recipe creation and control software also allow users to easily select the optimum deposition parameters for specific materials and processes with a few simple keystrokes. AIX 2800 G4 HT is designed to ensure minimal maintenance and excellent operational reliability. It features an integrated gas delivery tool that automates the installation and maintenance processes for process gases. In addition, an advanced in-process particle monitoring asset ensures high-quality coating of films by eliminating particles that can affect performance. In conclusion, AIXTRON AIX 2800 G 4 HT is an effective and efficient high-throughput, single-wafer planetary reactor ideal for the thermally enhanced deposition of a wide range of thin film materials. The model is equipped with a variety of features and technologies that ensure optimal thermal balance, uniformity of film thickness, reliable operation and minimal maintenance.