Used AIXTRON AIX 2800 G4 HT #9222201 for sale

AIXTRON AIX 2800 G4 HT is a high-throughput (HT) reactor used for the production of compound semiconductor materials. It is an epitaxial growth tool designed for material research and development, process optimization and multi-material device fabrication. AIXTRON AIX 2800G4-HT is a dual-wafer horizontal equipment with a temperature range of up to 800 °C and automated reaction gas control. AIX 2800G4 HT features advanced high-throughput process capabilities, allowing up to 200 wafers to be processed in one batch. It features a variety of molecular beam epitaxy (MBE) processes, including chemical beam epitaxy (CBE) and molecular layer deposition (MLD). Additionally, AIXTRON AIX 2800G4 HT can be adapted to physical vapor deposition (PVD) processes, such as atomic layer deposition (ALD) and spin-on deposition (SOD). This flexibility makes AIX 2800 G4 HT ideal for complex processes and applications such as heterostructure fabrication. AIX 2800 G 4 HT features automated multi-zone heating, enabling precise and uniform processing temperatures across the entire wafer surface. The system also offers automated in-situ gas analysis capabilities for process optimization. It can monitor nitridation and oxidation processes, nitrogen oxide deposition, and the deposition of metals and organics. AIX 2800G4-HT is capable of measuring reaction gases with a high degree of accuracy and resolution. AIXTRON AIX 2800 G 4 HT's enclosure features advanced security and safety features, including an integrated helium leak detector and a safety shutoff switch. It is also equipped with an automated processes and logging unit that records all information from the process run, including gas usage and temperatures. Additionally, the machine provides a wide range of software tools for the development and optimization of processes and materials. AIXTRON AIX 2800 G4 HT is a powerful and flexible compound semiconductor processing tool, capable of a variety of growth processes. Its advanced process capabilities, automated gas control and in-situ gas analysis make it an ideal tool for device fabrication, material research and process optimization.