Used AIXTRON AIX 2800 G4 HT #9226196 for sale

AIXTRON AIX 2800 G4 HT is a high-temperature chemical vapor deposition reactor that utilizes rapid thermal processing (RTP) and multi-zone heating technology. This advanced technology is designed to deposit thin films on substrates in a repeatable and reliable manner. The RTP allows for efficient and uniform heating of the substrate and reactor chamber by using multiple heater elements and a variety of gases. AIXTRON AIX 2800G4-HT offers a low defect processing regime with good thermal uniformity and control, ideal for applications such as III-V and Silicon Photonics. AIX 2800G4 HT reactor is a highly customizable platform, capable of being configured for specific process conditions, such as temperature, pressure, and injection rate. Its production-grade design utilizes a distributed multi-zone heater with independent thermal control across the entire substrate. This configuration allows for precise control of the deposition rate, uniform surface coatings, and thin film properties. AIX 2800 G4 HT reactor utilizes enhanced precursors to create single-crystalline layers with excellent surface coverage. This reactor also supports closed-loop process control, allowing for automated and monitored deposition of the desired materials onto substrates. The high selectivity of this reactor ensures clean films and features, with excellent surface planarity and reduced edge bead formation. AIXTRON AIX 2800 G 4 HT also features high process stability, accuracy, and repeatability. Variable RF power allows for the precise control of the deposition rate, while a robust wafer handling system ensures gentle handling and secure transfer of the wafer substrates from the cassette to the chamber. AIXTRON AIX 2800G4 HT is the ultimate solution for industry-level depositions and coatings. Its advanced features, coupled with customizability, offer unsurpassed reliability and quality results for thin-film applications.