Used AIXTRON AIX 2800 G4 HT #9226650 for sale

AIXTRON AIX 2800 G4 HT is a commercial deposition reactor that has been designed to be used in the production of materials for the semiconductor and microelectronics industry. AIXTRON AIX 2800G4-HT is a high temperature deposition reactor, which means that it is capable of operating at temperatures of up to 1000°C. AIX 2800G4 HT features an advanced design that allows for precise control over the deposition process. The material growth occurs in a two-dimensional, rectangular reactor chamber. The chamber is equipped with four separate sources for the deposition process. AIXTRON AIX 2800G4 HT enables a broad range of deposition techniques, including chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE). In terms of performance parameters, AIX 2800 G4 HT provides a high level of accuracy and repeatability. It is equippied with an advanced control system with a wide radiation range and a uniform deposition rate. The maximum substrate size is 95 mm. The chamber is designed with a radial and axial uniformity of +/-3%. The pressure in the reactor can be adjusted to achieve a consistent deposition rate. AIX 2800 G 4 HT is constructed with several safety features, including a safety shutter that eliminates exposure to high temperatures, as well as an emergency shut-off system in case of any serious issues. The system is also designed with ample ventilation and filtration to ensure the optimal operation of the components. AIX 2800G4-HT has a wide range of applications in the electronics industry. These include the production of thin film transistors, electrochemical capacitors, field effect transistors, integrated circuits, and flat panel displays, among others. AIXTRON AIX 2800 G 4 HT is an efficient and reliable deposition reactor for industrial manufacturing applications.