Used AIXTRON AIX 2800 G4 HT #9232215 for sale

AIXTRON AIX 2800 G4 HT is a supersonic multi-wafer MOCVD (metal-organic chemical vapor deposition) reactor for the production of high-performance optoelectronic devices. It is designed to provide a high throughput of 8 wafers/batch and can accommodate up to 200mm diameter wafers. AIXTRON AIX 2800G4-HT is built with high-precision components, and provides process parameters to ensure uniformity and repeatability of layer growth. It is equipped with a high-temperature, heated susceptor, Peltier cooling, and a removable wafer boat, allowing for precise control of temperature, SiH4 etching rate, and other process parameters. This ensures a high level of throughput with minimal downtime and maximum yield. The features of AIX 2800G4 HT provide a range of advantages for optoelectronic film production. The high temperature susceptor and Peltier cooling enable the reactor to reach temperatures of up to 1000 °C, enabling the formation of even thin layers with exceptional crystallinity. This results in devices with excellent performance characteristics, such as enhanced parameters and improved device reliability. In addition, AIX 2800G4-HT is equipped with AIXTRON Ultra-Fine Processing (UFP) technology to ensure the process parameters are maintained at the highest precision levels, and to ensure repeatability and yield. This helps to guarantee high throughput and reliable, repeatable results. To ensure effective maintenance, AIXTRON AIX 2800 G 4 HT has a fault monitoring system to detect gas flows, temperatures, pressures, and other vital parameters. The data gathered is stored in a database that can be accessed remotely, helping optimize the quality of each substrate. AIXTRON AIX 2800G4 HT is an excellent optoelectronic reactor for production of high-performance films offering consistent results, high output capacity, and superior reliability. It brings together advanced technologies to meet any research or production needs of optoelectronic applications.