Used AIXTRON AIX 2800 G4 HT #9256336 for sale

AIXTRON AIX 2800 G4 HT is an advanced metal-organic chemical vapor deposition (MOCVD) reactor. It is a deposition equipment that uses a chemical source, such as metal/organic precursors, to create nanoscale films and structures. The system is designed for fabrication of heterogeneous and homogeneous materials, such as semiconductor crystals, thin films, nanoparticles, and related nanostructures. AIXTRON AIX 2800G4-HT uses high temperature to create high quality and uniform films. AIX 2800G4 HT is a high throughput, high temperature deposition unit. It is equipped with a quartz quartzware chamber that can accommodate a 4-inch wafer and an 8-inch wafer. This machine provides a variety of deposition processes such as low-pressure MOCVD (LP-MOCVD), atmospheric-pressure MOCVD (AP-MOCVD), and supercritical-fluid (SCF) deposition. It is also capable of handling material throughput up to 25nm. AIXTRON AIX 2800 G 4 HT is designed with a built-in reactive gas control tool. This asset provides a wide range of gas flow rate, temperature control, and pressure control for a variety of films and substrates. This model is also equipped with a wide range of process capabilities for controlling key parameters of the deposition process such as reaction temperature, propagation speed, and deposition rate. In addition, AIX 2800G4-HT is designed with an option for process monitoring and control. Its built-in process monitoring equipment allows real-time monitoring of the different aspects of the deposition process such as deposition condition, gas flow rate, substrate temperature, and film thickness. AIXTRON AIX 2800G4 HT is also equipped with a recipe library, which can be used to store and recall deposition recipes for repeatable process operation. Overall, AIX 2800 G4 HT is a versatile system that provides user-friendly, high-quality, and high-yield production of optoelectronic devices, electronic devices, and related nanostructures. It is a reliable unit that meets the industry-level standards for film quality, uniformity, and throughput, helping researchers and manufacturers to create material that can be used for a wide range of applications.