Used AIXTRON AIX 2800 G4 HT #9262094 for sale
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ID: 9262094
Vintage: 2010
MOCVD System
Type: GaN
Capacity: 6"x6" / 4"x11" / 2"x24"
9 Channels chamber coil
Hydride line: NH3, (2) Dopant
Purifier: H2, N2, NH3
Pumps:
DOR SH-110 Pump
EBARA ESA70 Pump
Susceptor dimension: 520 mm D x 19 mm T
H2 Purifier (In line type)
TERATECH TPH-LP-500S (100S)
Gas: Hydrogen
Process methods: Line purifier
Flow rate(Nm³/hr): 10, 30, 50, 75, 100, 150, 300
Impurities has been removed: H2, O2, H2O, CO, CO2
2010 vintage.
AIXTRON AIX 2800 G4 HT is a highly advanced deposition reactor designed for research and development applications in the semiconductor industry. It features a unique design that combines improved control of film growth with enhanced process repeatability, resulting in improved process throughput and better device yield. AIXTRON AIX 2800G4-HT utilizes a combination of design principles to optimize reactor performance. It features a strong source-utilization factor, which provides high source intensity and encourages efficient recombination of species, as well as a low-profile chamber for improved gas flow and uniform deposition. The reactor also features a speed-controlled wafer stage for high step repeatability and reliable wafer-to-wafer overlay. AIX 2800G4 HT is equipped with the latest deposition technologies, including multiple-source reactive ion-deposition, substrate independent deposition, off-axis coating, and dual-target thermal field evaporation. These technologies enable research and development in areas such as 3D integrated circuits, ultra-large-scale integration, compound semiconductors, optical coatings, and copper metallization. AIX 2800 G 4 HT features advanced process control capabilities, allowing for rapid inspection and adjustment of deposition parameters during growth. This control is achieved through a sophisticated combination of logging and tuning algorithms, which ensure nucleate and layer settings remain optimized for the particular process. AIX 2800G4-HT provides maximum substrate motion for faster processes, as well as a completely enclosed environment for improved safety. An intuitive user interface allows for easy process setup and monitoring, and the system is compatible with all leading semiconductor fab management software. Overall, AIX 2800 G4 HT is a powerful and versatile deposition tool, offering users precise control of film growth and process repeatability. As such, it is ideal for experimenting with the latest semiconductor technologies.
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