Used AIXTRON AIX 2800 G4 HT #9305775 for sale

AIXTRON AIX 2800 G4 HT is a high-temperature metal organic chemical vapor deposition (MOCVD) reactor designed for the production of crystalline films of III-V and II-VI semiconductor materials. AIXTRON AIX 2800G4-HT includes a stripped-down version of the AIX 2800 G4 with a significantly reduced vacuum equipment, insulated reaction chamber walls, and a higher temperature capability. This configuration makes AIX 2800G4 HT suitable for the growth of materials that demand the use of higher temperatures and with a reduced cost in relation to the full-featured AIX 2800 G4. AIXTRON AIX 2800 G 4 HT features a vertical reaction chamber, which is designed to be heated up to maximum working temperatures of 850°C. This chamber is kept at ultra-high vacuum levels with an optimized combination of turbo pump, diffusion pump, and backing pumps. The maximum pumping speed achieved by this system is higher than the one provided in the standard AIX 2800 G4. The process chamber also features a heated throttling valve to improve process temperature control, separate heating zones for the wafer carousel, and the ability to add additional heating elements on top of the existing ones. AIX 2800G4-HT can use both standard and customized advanced purge gases to create a range of reaction conditions, enabling its users to grow high-quality films for a variety of device applications. This unit also supports the use of many substrate sizes, from 2-inch to 8-inch, to allow for the growth of various film types. AIXTRON AIX 2800G4 HT also includes a digital instrumentation machine with a range of different controls such as Gas Manager, X-Y stage, Heater Power, and Deposition Rate. This instrumentation tool is designed to provide researchers with access to comprehensive process control, data acquisition, and monitoring. Overall, AIX 2800 G 4 HT is a robust and high-temperature MOCVD reactor offering various temperature control options and advanced process features to enable the deposition of high-quality films. Its streamlined chamber geometry and reduced vacuum asset make it an especially cost-effective solution for temperature-intensive processes.