Used AIXTRON AIX 2800 G4 HT #9386939 for sale

AIXTRON AIX 2800 G4 HT
Manufacturer
AIXTRON
Model
AIX 2800 G4 HT
ID: 9386939
Vintage: 2007
MOCVD System CCS 42, 2" 2007 vintage.
AIXTRON AIX 2800 G4 HT is a deposition reactor specifically designed to enable a sequence of processes for epitaxy and deposition of films. It has a direct-drive, multi-zone linear lamp configuration with high efficiency and high, homogenous illumination uniformity. It is equipped with high-precision, low-temperature shutters with a shutter opening time of just 0.3 secs that allow for easy switching of growth rate and process endpoints. AIXTRON AIX 2800G4-HT features two gas lines for delivery of hydrogen, one for the reactants, and one for the carrier gases. It provides a range of reactants to ensure high-quality growth of various types of thin films. With its state-of-the art thermal controller for precise regulation of process temperature, AIX 2800G4 HT ensures maximum process uniformity and control. This deposition reactor provides a secure, easy-to-use operating climate while ensuring maximum safety for the user. It is equipped with embedded visual process monitoring systems for visual monitoring of the deposition process on real-time basis throughout the reactor chamber. AIXTRON AIX 2800 G 4 HT also has triple-locking remote shut-off mechanism, ensuring the highest safety standards. AIX 2800 G 4 HT has been designed to ensure maximum accuracy in thin film deposition layers. It features an advanced backside temperature monitoring system to enable deposition of high-quality films even at elevated temperatures. It also comes with an ultra-sensitive optical emission spectrometer, which enables precise feedback from the deposition chamber at high frequency, resulting in superior growth rate control. AIXTRON AIX 2800G4 HT is further equipped with cost-effective effluent management system, which allows for lowest possible costs compared to any other deposition reactor. This reactor can be used to deposit high-quality, complex thin films with precise compositional uniformity. It is designed to provide the user with reliable, reproducible results, making it one of the best deposition reactors available today.
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