Used AIXTRON AIX 2800 G4 #9229944 for sale

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Manufacturer
AIXTRON
Model
AIX 2800 G4
ID: 9229944
Wafer Size: 4"-6"
Vintage: 2008
Epitaxial cluster system, 4"-6" Process: SiC-Epitaxy Gases: C3H8, SiH4, H2 & GMS Prepared for Chlorine Chamber Spare parts Accessories: RF Generator Scrubber Heater Power supply: 380 V, 63 A, 50 Hz, 3 Phase CE Marked 2008 vintage.
AIXTRON AIX 2800 G4 is a research-grade chemical vapor deposition (CVD) reactor designed for semiconductor device development, production, and research. The equipment is ideal for producing high-quality materials and devices in demanding industrial and scientific applications such as printed electronics, advanced materials, and nano-devices. AIXTRON AIX2800G4 features a cold-wall, 10-zone glancing showerhead process chamber that measures 667mm in diameter and 890mm in height. The process chamber is capable of accommodating larger substrates up to 450×450mm in size. The chamber is well-isolated and has a design pressure of 2 mbar, ensuring high process repeatability. The system is also equipped with advanced in-situ temperature control, which offers stability and accuracy within +/-1 °C of the set value. AIX 2800G4 is powered by AIXTRON PRECISION+™ process control software, which provides users with an intuitive interface and advanced capability in process control and optimization. The PRECISION+™ software allows users to access process recipes from anywhere in the world, remote control processes from any web-enabled device, and set up process runs in real-time. It also features a powerful data logging unit which provides users with comprehensive process analytics and monitor machine performance over long-term operation. AIXTRON AIX 2800 G 4 reactor features PDP-MC™ multi-source deposition technology for improved process throughput and enhanced film homogeneity. The tool is also equipped with the Turbo-ColdWall™ technology for uniform temperature distribution, low film stress, and improved process stability. It also features a powerful, automated loading and unloading asset, which helps improve productivity and reduce downtime. Overall, AIX 2800 G4 research-grade CVD reactor is a high-performance model which offers outstanding process stability and uniformity. The use of advanced technologies coupled with the helpful user interface and process control software makes it ideal for producing high-quality films in challenging industrial and scientific applications.
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