Used AIXTRON AIX 2800 G4 #9286299 for sale

AIXTRON AIX 2800 G4 is a state-of-the-art, close-coupled, forced-flow, liquid-reaction chamber for the manufacture of advanced semiconductor structures. Key features of this equipment include a front-opening load-lock chamber, automated source-chamber-shutter operation, remote-controlled source-orientation and a third-generation LPCVD process chamber. AIXTRON AIX2800G4 is designed to deliver superior film-properties and excellent material throughput, making this system well-suited for a wide range of submicron applications, including advanced lithography, MEMS, optoelectronics, Power-MOS and CMOS-structures. The unit offers an effective loading rate of 80 Wafer per hour and integrated reactive flow machine which provides a highly consistent results. It is based on a raised-floor tool, providing access to a variety of flexible robot and chambers. AIX 2800G4 can execute four-step source montage sequence with a source arm designed to perform precision source orientation and temperature stabilization. The asset also provides advanced temperature-control features for improved uniformity over the process distance. The LPCVD process chamber is equipped with RF heating and hydrogen and process gases, enabling efficient deposition of various materials. The highly accurate thickness control enables excellent repeatability and the ability to deposit interconnected layer structures. AIX 2800 G4 is one of the most advanced reactors for semiconductor structures in the market today. It features advanced automation, high throughput and reliable in situ monitoring to enable users to produce high quality, advanced semiconductor devices. The model is also easy to maintain, allowing it to remain in service for many years with minimal downtime. This reactor is well-suited for research laboratories, semiconductors manufacturer and universities seeking to produce advanced semiconductor devices.