Used AIXTRON AIX 2800 G4 #9394709 for sale

AIXTRON AIX 2800 G4 is a state-of-the-art PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment for the industrial production of various thin film Patterned Sapphire Substrates (PSS) and structured coatings. The reactor is designed to deliver the highest performance and flexibility in thin film deposition. The most notable feature of AIXTRON AIX2800G4 is its powerful ICP (inductive coupled plasma) source. This source incorporates a second generation ICP generator, along with a specially designed power controller. The power controller provides up to 5 different power levels, giving users the ability to adjust plasma parameters on the fly. This improved control of plasma conditions enables uniform coating thickness and excellent uniformity of Plasma Enhanced Chemical Vapor Deposition (PECVD) layers. AIX 2800G4 also features a high-precision positional gas feed system for both reactant gases and purge gases. It includes an automated pressure regulator, flow valves, and a multi-zone manifold to feed reactant gases to the ICP source. This allows users to precisely control the input of pure and reactive gases, thus controlling the film deposition rate accurately. AIX 2800 G 4 is able to match the highest global market standards in terms of precise and precise dose control. As a reactor designed for the production of PSS, AIX 2800 G4 comes with a dual reactor chamber design that is optimized to enable precise, uniform coating on PSS. This dual chamber design features an inner high chamber for film deposition and an outer lower chamber for patterning. The precise temperature and pressure control of these two chambers enables extremely precise control of pressure and temperature in the deposition chamber, resulting in uniformity of PSS layers. The reactor also features high positioning accuracy and uniformity. This means that it is able to accurately position masks and stencils in order to achieve the highest possible resolution for PSS production. The unit can even be used for High Resolution Laser Assisted Deposition (HRLAD) of PSS. Overall, AIXTRON AIX 2800 G 4 is a powerful and precise PECVD reactor machine that offers industry-leading performance and flexibility. Its advanced ICP generator and positional gas feed tool provide precise control of plasma parameters and reactant gases, while its dual reactor chamber design ensures precise deposition and patterning of PSS. Its high positional accuracy and uniformity make it ideal for high resolution PSS production.