Used AIXTRON AIX 2800 G4 #9394717 for sale

AIXTRON AIX 2800 G4 is a low-pressure Chemical Vapor Deposition (CVD) reactor that helps facilitate the process of creating thin films used in the production of various advanced substrates. This versatile reactor enables the deposition of various materials such as polycrystalline silicon and nanomaterials, while simultaneously providing a number of benefits to users including low thermal budget, increased deposition rate, and safer operation. AIXTRON AIX2800G4 is composed of a temperature-controlled reaction chamber, along with a shutter, plasma generator, and planar cassettes. The temperature-controlled reaction chamber is typically composed of a graphite heat-sink, a ceramic heat-shield, a susceptor, and a two-zone silica-fused quartz jacket. A vertical actuator can be installed for manual positioning of the substrate and allows for different substrates to be used. The shutter is controlled by a precision screw drive, and is used to regulate the process of material deposition. The plasma generator provides the energy required for the chemisorption of the reactants, and is designed to provide very localized plasma. The planar cassettes provide carriers of various substrates without having to change the susceptor. In order to ensure a safe operation and efficient production, AIX 2800G4 includes safety systems such as PIR sensors and pressure sensors. The PIR sensors detect any strong radiation, while the pressure sensors are used to monitor the pressure inside the reactor, and to alert the user when it is no longer within the operational limit. AIXTRON AIX 2800G4 also possesses many user-friendly features, such as the automatic system interfaces, and the touchscreen operator interface, where users can access information such as process parameters and reactor set up conditions. AIXTRON AIX 2800 G 4 is a versatile and reliable reactor that is suitable for depositing a variety of materials for a variety of advanced substrates. It provides users with low thermal budget, increased deposition rate and increased safety with the safety systems and user-friendly features. AIX 2800 G 4 is an ideal low-pressure Chemical Vapor Deposition reactor for a wide range of applications.