Used AIXTRON AIX 2800 G4 #9412483 for sale

AIXTRON AIX 2800 G4 is a high-powered and versatile ultra-short pulsed Pulsed Deposition Reactor designed for various thin film applications. AIXTRON AIX2800G4 is equipped with advanced technology and components that allow for intense pulse energies and rapid repetition rates for rapid deposition of thin-film materials in a variety of conditions. AIX 2800G4 has the ability to operate in short pulse mode and permittivity mode and be configured for a variety of substrate sizes and geometries. AIX 2800 G 4 boasts a high-power microwave power generator and has a switchable 400 kW peak power with a pulse duration of 1-20 microseconds and a repetition rate of up to 30 kHz. A high temperature heating element enables substrates to reach peak temperature up to 1100 °C. This high temperature is important in obtaining an optimal film thickness and uniformity. AIX2800G4 offers a wide range of process control features, such as pressure and temperature control, flux control, and open-loop control. The reactor has built in systems that compensate for aberrations caused by variations in ambient pressure and substrate temperature. AIXTRON AIX 2800 G 4 also has a built-in feedback system to ensure substrate temperature and pressure stability during the pulse deposition process. AIXTRON AIX 2800G4 has two main process chambers. Each chamber is equipped with two planar antennae to enable processes such as layer transfer, plasma-etching, RIE-etching, deposition, and film patterning. The substrate holder is designed to accommodate a wide range of substrate sizes and geometries. AIX 2800 G4 also offers an onboard computer with user-friendly navigation and real-time process control. The reactor can be operated remotely with software packages installed on the control system that allows automatic process cycle control and run through. Additionally, it supports a data acquisition system with image processing capabilities. AIXTRON AIX 2800 G4 includes accessories such as clamping and transport systems, gas inlets, gas sampling tubes, and leakage lines. AIXTRON AIX2800G4 is capable of running in a variety of configurations and conditions ideal for processes such as atomic layer deposition (ALD), metal organic chemical vapor deposition (MOCVD), and physical vapor deposition (PVD).