Used AIXTRON AIX 2800 G5 HT #9226657 for sale

AIXTRON AIX 2800 G5 HT is a high-performance reactive-ion-etching (RIE) reactor designed for the precise etching of large-scale substrates. The AIX 2800 is capable of both low-energy (LE) and high-energy (HE) etching, a feature which enables it to offer maximum flexibility and process accuracy. The AIX 2800 is equipped with a 13.56 MHz generator and a cavity with provisions for multi-layer cathode/QCM control. This configuration provides improved uniformity of the etch process, high etch uniformity across the wafer surface, and improved repeatability. The AIX 2800 also features dual load locks, a multistage pump set-up, a chamber temperature control system with real-time temperature monitoring, and a built-in PLC and Schneider Electric servo controller. This advanced feature set allows for the running of multistage etching recipes with high repeatability and accuracy, as well as enhanced automation and process system control. The AIX 2800 also features the latest technology in in-situ residual gas analysis. This system utilizes a mass spectrometer attached to the process chamber to analyse the constituents of the chamber's atmosphere in order to optimize the etching performance for each process stage. The AIX 2800's versatile etching capabilities, its advanced featureset, and its compatibility with wide range of substrates make it an ideal etch tool for production facilities in the semiconductor, MEMS, and LED industries. It is an efficient and reliable tool for minimizing cost and increasing device yield in the fabrication process.