Used AIXTRON AIX 2800 G5 HT #9241907 for sale

AIXTRON AIX 2800 G5 HT is a sophisticated high-throughput and roll-to-roll (R2R) production scale semiconductor reactor that is used to process a variety of semiconductor materials for opto-electronics, opto-mechanical, and micro-electromechanical systems (MEMS) applications. It is capable of supporting temperatures from 300C to 1000C and provides high process repeatability and uniformity over large substrate areas. This reactor is equipped with a double source LLAG with high uniformity and selectable energy to meet flexible process needs. The high temperature design provides high doping annealing and less particle adherence. Additionally, it supports thick film deposition in both open and enclosed area. The reactor has special applications that include metalorganic chemical-vapor deposition (MOCVD) and atomic layer deposition (ALD). In addition, the reactor's modular design greatly facilitates increased throughput options or additional end-station needs. AIXTRON AIX 2800G5 HT features a quartz react chamber with temperature uniformity up to 0.3C, along with a process gas delivery system to its in-situ gas monitor. This enables the reactor to monitor and quantify process gases in real time. It is also equipped with a motorized process deck for more efficient substrate loading and processing, as well as an automatic alignment system for substrate on board. AIX 2800 G5 HT features advanced control and automation capabilities that allow for improved process reliability, repeatability and yield. There are areas where AIX 2800G5 HT stands out in particular, such as its process control Software: THE E-Toolz, which allows customers to conduct custom- and ad-hoc process recipes as well as process parametric maps on their own systems rather than relying on external service providers. AIXTRON AIX 2800 G5 HT offers broad process capability. It is a leader in multiple process areas, such as liquid sources, thermal emitters for e-beam and ion beam sources, and surface-controlled thin film processes. The reactor is also equipped with gas distribution control for uniform gas/vapour delivery, high vacuum capabilities, and a high-performance deposition control system. In conclusion, AIXTRON AIX 2800G5 HT is a high throughput and R2R production reactor that is capable of supporting a wide range of temperature ranges and process needs. By its modular design and advanced process control and automation capabilities, it offers great opportunities for enhanced reliability, repeatability, and yield. Additionally, its features such as THE E-Toolz for custom and ad-hoc process recipes provides customers with more control over their processing.